Atmospheric Pressure CVD (APCVD) System for Small-scale Production and Development (D501)
For prototyping, development, and small lot production For deposition of NSG(SiO2)/BSG/PSG/BPSG Batch processing (simultaneous processing of multiple substrates) APCVD system
The D501 is a batch processing (multiple-unit simultaneous processing) atmospheric pressure CVD system (APCVD system) for small-volume production/testing and silicon oxide deposition (SiO2 deposition) on irregularly shaped substrates. 【Features】 ・Simultaneous processing of substrates of different shapes and sizes ・High deposition speed ・Simple maintenance ・Small footprint ・Low CoO (low running cost) 【Applications】 ・Interlayer insulating (NSG/PSG/BPSG) ・Hard mask for diffusion/ion implantation, Sacrificial deposition (NSG) ・Passivation deposition (protective deposition, insulating deposition) (NSG) ・Source films for solid phase diffusion for solar cells (BSG, PSG)/Cap deposition (NSG) *For more details, please contact us or download the catalog for further information.
- 企業：M.WATANABE & CO.,LTD.
- 価格：Other
